The ONDL operates a set of five laboratories. These have been set up over four phases beginning in 2005. The final phase was completed in 2010. Rebuild in 2016 to comply with fire safety standards. ONDL 1-4 are a set of Class 1000 and Class 10,000 cleanrooms (total area 240 sq m) with local Class 100 clean space, while ONDL 5 is a wet chemistry laboratory.
ONDL 1: Class 1000 Fabrication Facility with full capabilities
in optical lithography, plasma processing (silicon
oxide and ammonia-free silicon nitride CVD; O2- and
CF4-based RIE; and general O2 barrel plasma), glovebox
fabrication with integrated spinner and a customised
electron-beam and thermal evaporation chamber, wire-bonder, and
Class 100 laminar flow hoods.
ONDL 2 and 3: Class 10,000 Characterisation Facility for the optical and electrical characterisation of polymer organic semiconductor films and devices, with variable temperature capabilities in the characterisation of light-emitting diodes, transistors, photovoltaics and solar cells, and luminescent films. We also operate a multi-excitation-line Raman microscope, facilities to perform both wavelength and radiometric calibrations of our photodiodes and spectrometers traceable to NIST standards, UV-Vis-NIR-FTIR spectrometers and a spectroscopic ellipsometer. We also operate home-built electromodulated absorption spectroscopy, internal photoemission and charge-modulation spectroscopy rigs.
ONDL 4: Class 1000 Film Processing Facility comprising materials
inkjet printers. We also operate a cryogenic probe station that goes down to 4 K.
- ONDL 5: Chemistry wet lab with fumehoods complete with chemical synthesis facilities.
We make and
prototype the following devices in our research: polymer organic light-emitting diodes
(OLEDs), organic field-effect transistors (OFETs), organic
photovoltaics (OPVs) and solar cells.
non-device characterisation, we are supported
by Department and Faculty research facilities including AFM, SEM, TEM, UPS, XPS, XRD, NEXAFS, elemental microanalysis, NMR, DSC, TGA, etc,
some of which we operate ourselves.
combination of physics and chemistry tools based on dedicated device cleanroom facilities
supported by a wide range of general characterisation facilities
provides us the competitive
edge to our research.